| Sputtering TargetsHIGH PURITY, HOMOGENEOUS MATERIALS WITH 100% DENSITY CAN BE PRODUCED WITH POWDER METALLURGY, CAPSULE TECHNOLOGY AND HOT ISOSTATIC PRESSING (HIP).
Such PM sputtering targets may be further HIP bonded to a suitable supporting substrate.
HIP diffusion bonding is also used to bond solid targets to the required backing plate.
Bodycote’s service is to offer the technologies which can manufacture these high tech parts in flat or cylindrical forms.
Manufacturing
Targets often consist of refractory materials, ceramics or other materials which cannot be made by melting techniques but may be manufactured by a powder metallurgical route.
The microstructure, homogeneity, as well as purity of the targets can be improved or modified.
Typical systems are:
- Pure metals
- Alloys
- Phase mixtures
- Cermets
- Intermetallics
- Ceramics
The more conventional technique for manufacturing include the pressing of powders or powder mixtures and subsequently sintering or hot pressing, forging or rolling which limits the purity, form and size of the targets.
Advantages
Capsule technology and the technical capabilities of the Bodycote HIP units open a wide range of possibilities of size, design and chemical composition in target manufacturing.
Many smaller targets may be produced in one step. Target material may be bonded onto a cooling plate without interface porosity.
Higher sputtering rates can be achieved by HIPping cooling pipe systems into the target material or backing plate.
Applications:
Metallurgical coatings
PVD, CVD
Coatings for tools
Decorative coatings
Glass coatings
Magnetic memory materials
Microelectronics layers
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